The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2016
Filed:
Sep. 06, 2013
Applicant:
Shimadzu Corporation, Kyoto-shi, Kyoto, JP;
Inventors:
Kei Kodera, Kyoto, JP;
Makoto Hazama, Takarazuka, JP;
Assignee:
SHIMADZU CORPORATION, Kyoto, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/42 (2006.01); H01J 49/44 (2006.01);
U.S. Cl.
CPC ...
H01J 49/424 (2013.01); H01J 49/427 (2013.01); H01J 49/4285 (2013.01);
Abstract
Provided is an ion selection method capable of isolating and leaving a target ion in an ion trap within a short period of time and with high separating power. In a digital ion trap, after ions over a wide range of m/z near a target ion are selectively retained by rough isolation using an FNF signal or the like (S), unnecessary ions on a low-mass side are removed with high separating power by changing the duty ratio of a rectangular voltage (S). Furthermore, unnecessary ions on a high-mass side are removed with high separating power by resonant excitation discharge (S).