The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 19, 2016

Filed:

Oct. 29, 2012
Applicant:

Leco Corporation, St. Joseph, MI (US);

Inventors:

Anatoly N. Verenchikov, St. Petersburg, RU;

Mikhail I. Yavor, St. Petersburg, RU;

Timofey V. Pomozov, Arkhangelsk, RU;

Assignee:

LECO Corporation, St. Joseph, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/40 (2006.01); H01J 49/48 (2006.01); H01J 49/06 (2006.01); H01J 49/28 (2006.01);
U.S. Cl.
CPC ...
H01J 49/061 (2013.01); H01J 49/282 (2013.01); H01J 49/405 (2013.01); H01J 49/406 (2013.01);
Abstract

An electrostatic ion mirror is disclosed providing fifth order time-per-energy focusing. The improved ion mirror has up to 18% energy acceptance at resolving power above 100,000. Multiple sets of ion mirror parameters (shape, length, and voltage of electrodes) are disclosed. Highly isochronous fields are formed with improved (above 10%) potential penetration from at least three electrodes into a region of ion turning. Cross-term spatial-energy time-of-flight aberrations of such mirrors are further improved by elongation of electrode with attracting potential or by adding a second electrode with an attracting potential.


Find Patent Forward Citations

Loading…