The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2016
Filed:
Feb. 25, 2013
Applicant:
Kuraray Co., Ltd., Kurashiki-shi, JP;
Inventors:
Assignee:
KURARAY CO., LTD., Kurashiki-shi, JP;
Primary Examiner:
Int. Cl.
CPC ...
C07D 275/04 (2006.01); C07D 275/06 (2006.01); G03F 7/038 (2006.01); C08F 20/38 (2006.01); G03F 7/039 (2006.01); C08F 228/02 (2006.01); C08F 128/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); C07D 275/04 (2013.01); C07D 275/06 (2013.01); C08F 20/38 (2013.01); C08F 128/06 (2013.01); C08F 228/02 (2013.01); G03F 7/0397 (2013.01);
Abstract
Provided is an acrylic acid ester derivative which, when used as a constituent unit of a polymer which is included in a photoresist composition for a semiconductor, exhibits excellent lithography characteristics such as LWR and the like. Specifically, provided is an acrylic acid ester derivative represented by the following general formula (1). Furthermore, provided are an intermediate of the acrylic acid ester derivative and a process for producing the same; a polymer containing the acrylic acid ester derivative as a constituent unit; and a photoresist composition for a semiconductor containing the polymer.