The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 19, 2016

Filed:

Jun. 15, 2012
Applicants:

Andriy Kharchenko, Palaiseau, FR;

Jean-paul Rousseau, Boulogne, FR;

Antje Jung, Dueren, DE;

Christian Bernhard Petersen, Aachen, DE;

Inventors:

Andriy Kharchenko, Palaiseau, FR;

Jean-Paul Rousseau, Boulogne, FR;

Antje Jung, Dueren, DE;

Christian Bernhard Petersen, Aachen, DE;

Assignee:

SAINT-GOBAIN GLASS FRANCE, Courbevoie, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C23C 14/08 (2006.01); C23C 14/06 (2006.01); C03C 17/00 (2006.01); C23C 14/00 (2006.01); C23C 14/10 (2006.01);
U.S. Cl.
CPC ...
C23C 14/083 (2013.01); C03C 17/001 (2013.01); C03C 17/006 (2013.01); C23C 14/0057 (2013.01); C23C 14/06 (2013.01); C23C 14/0605 (2013.01); C23C 14/10 (2013.01); C03C 2217/425 (2013.01); Y10T 428/24997 (2015.04); Y10T 428/249969 (2015.04);
Abstract

A process for manufacturing glazing including a substrate provided with a coating including a layer consisting of a porous material, includes depositing on the substrate, via a physical vapor deposition (PVD) process in a vacuum chamber, a coating including a layer of a material including an element selected from Si, Ti, Sn, Al, Zr, In or a mixture of at least two of these elements, oxygen and carbon, the layer in addition optionally including hydrogen, heat treatment of the layer thus deposited, under conditions that enable at least one portion of the carbon to be removed and the layer of porous material to be obtained, wherein the deposition is carried out, on the substrate passing through the chamber, by the sputtering of a carbon target, under a reactive plasma atmosphere including a precursor of the element or elements.


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