The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 19, 2016
Filed:
May. 25, 2011
Douyan Wang, Kumamoto, JP;
Daisuke Seki, Kumamoto, JP;
Tako Namihira, Kumamoto, JP;
Hisato Saito, Kumamoto, JP;
Hidenori Akiyama, Kumamoto, JP;
Douyan Wang, Kumamoto, JP;
Daisuke Seki, Kumamoto, JP;
Tako Namihira, Kumamoto, JP;
Hisato Saito, Kumamoto, JP;
Hidenori Akiyama, Kumamoto, JP;
NATIONAL UNIVERSITY CORPORATION KUMAMOTO UNIVERSITY, Kumamoto-Shi, JP;
Abstract
Disclosed is a liquid culture medium for substance introduction, which is capable of increasing the survival rate of cells after substance introduction as much as possible when the cells are irradiated with plasma for the purpose of introducing a target substance into each of the cells. Specifically disclosed is a liquid culture medium for substance introduction, which is used for the purpose of introducing a predetermined target substance into a cell and enables introduction of the target substance into the cell by having the cell in the liquid culture medium, which contains the target substance, irradiated with a plasma jet. The liquid culture medium contains a damage preventing component that prevents the cell from damage due to the plasma jet.