The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 19, 2016

Filed:

Apr. 29, 2014
Applicant:

Fuji Xerox Co., Ltd., Tokyo, JP;

Inventors:

Hideaki Yoshikawa, Kanagawa, JP;

Yuka Zenitani, Kanagawa, JP;

Hiroyoshi Okuno, Kanagawa, JP;

Shunsuke Nozaki, Kanagawa, JP;

Shinichiro Kawashima, Kanagawa, JP;

Sakae Takeuchi, Kanagawa, JP;

Yasuo Kadokura, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J 3/12 (2006.01); G03G 9/08 (2006.01); G03G 9/097 (2006.01);
U.S. Cl.
CPC ...
C08J 3/128 (2013.01); G03G 9/0804 (2013.01); G03G 9/0806 (2013.01); G03G 9/0819 (2013.01); G03G 9/0827 (2013.01); G03G 9/09716 (2013.01); G03G 9/09725 (2013.01); C08J 2325/06 (2013.01); C08J 2367/03 (2013.01); C08J 2375/04 (2013.01); Y10T 428/2993 (2015.01); Y10T 428/2996 (2015.01);
Abstract

A resin particle having: a resin mother particle; and silica particles external added onto the surface of the resin mother particle, wherein a primary particles of the silica particles which have a volume average particle diameter of from 100 nm to 500 nm, a particle size distribution index of from 1.40 to 1.80 and an average circularity of from 0.5 to 0.85 has a regression line expressed by the following expression (1) with respect to the circularity and the volume average particle diameter (nm):Circularity=α×(Volume average particle diameter)/1000+β  (1)wherein α is from −2.5 to −0.9, and β is from 0.8 to 1.2.


Find Patent Forward Citations

Loading…