The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 19, 2016

Filed:

Mar. 12, 2013
Applicant:

Dow Global Technologies Llc, Midland, MI (US);

Inventors:

Otto J. Berbee, Hulst, NL;

Cornelis F. J. den Doelder, Terneuzen, NL;

Teresa P. Karjala, Lake Jackson, TX (US);

Karl Zuercher, Samstagern, CH;

Jian Wang, Rosharon, TX (US);

Stefan Hinrichs, Wondelgem, BE;

Assignee:

Dow Global Technologies LLC, Midland, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 110/02 (2006.01); C08L 23/06 (2006.01); C08L 23/08 (2006.01); C09D 123/06 (2006.01); C09D 123/08 (2006.01);
U.S. Cl.
CPC ...
C08F 110/02 (2013.01); C08L 23/06 (2013.01); C08L 23/0815 (2013.01); C08L 23/0869 (2013.01); C09D 123/06 (2013.01); C09D 123/0815 (2013.01); C09D 123/0869 (2013.01); C08L 2205/02 (2013.01); C08L 2205/025 (2013.01); C08L 2207/066 (2013.01);
Abstract

The invention provides a composition comprising a first ethylene-based polymer, formed by a high pressure, free-radical polymerization process, and comprising the following properties: a) a Mw(abs) versus I2 relationship: Mw(abs)<A×[(I2)], where A=5.00×10(kg/mole)/(dg/min), and B=−0.40; and b) a MS versus I2 relationship: MS≧C×[(I2)], where C=13.5 cN/(dg/min), and D=−0.55.


Find Patent Forward Citations

Berbee, Otto. (2016). Low density ethylene-based polymers with high melt strength (U.S. Patent No. 9394389). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9394389

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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