The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2016

Filed:

Jul. 07, 2015
Applicant:

Industrial Technology Research Institute, Hsinchu, TW;

Inventors:

Man-Lin Chen, Miaoli Hsien, TW;

Hsien-Kuang Lin, Hsinchu, TW;

Sue-May Chen, Taipei, TW;

Su-Huey Chen, Hsinchu, TW;

Yu-Lin Liu, Guanxi Township, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 1/03 (2006.01); H05K 3/28 (2006.01); G03F 7/038 (2006.01); H05K 1/02 (2006.01);
U.S. Cl.
CPC ...
H05K 1/0313 (2013.01); G03F 7/0388 (2013.01); H05K 1/02 (2013.01); H05K 3/287 (2013.01);
Abstract

A method of forming a biomass photosensitive material is provided, which includes () polymerizing (a) itaconic anhydride and (b) acrylate to form a copolymer, and () mixing the copolymer and (c) monomer with a single hydroxy group and a carbon-carbon double bond for a ring-opening addition reaction, wherein the (a) itaconic anhydride and the single hydroxy group of the (c) monomer with the single hydroxy group and the carbon-carbon double bond are reacted in the ring-opening addition reaction.


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