The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2016
Filed:
Dec. 17, 2014
Lytro, Inc., Mountain View, CA (US);
Graham Butler Myhre, San Francisco, CA (US);
Chia-Kai Liang, San Jose, CA (US);
Colvin Pitts, Snohomish, WA (US);
Carl (Warren) Craddock, San Francisco, CA (US);
Yi-Ren Ng, Palo Alto, CA (US);
Lytro, Inc., Mountain View, CA (US);
Abstract
According to various embodiments, the system and method disclosed herein facilitate the design of plenoptic camera lens systems to enhance camera resolution. A first configuration for the plenoptic camera may first be selected, with a first plurality of variables that define attributes of the plenoptic camera. The attributes may include a main lens attribute of a main lens of the plenoptic camera and/or a phase mask attribute of a phase mask of the plenoptic camera. A merit function may be applied by simulating receipt of light through the main lens and the plurality of microlenses of the first configuration to calculate a first merit function value. The main lens attribute and/or the phase mask attribute may be iteratively perturbed, and the merit function may be re-applied. An optimal set of variables may be identified by comparing results of successive applications of the merit function.