The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2016
Filed:
Jul. 24, 2014
Oned Material Llc, Palo Alto, CA (US);
Sharp Kabushiki Kaisha, Osaka, JP;
Erik Freer, Campbell, CA (US);
James M. Hamilton, Sunnyvale, CA (US);
David P. Stumbo, Pleasanton, CA (US);
Kenji Komiya, Osaka, JP;
Akihide Shibata, Osaka, JP;
SHARP KABUSHIKI KAISHA, Osaka-shi, Osaka, JP;
Abstract
Methods, systems, and apparatuses for nanowire deposition are provided. A deposition system includes an enclosed flow channel, an inlet port, and an electrical signal source. The inlet port provides a suspension that includes nanowires into the channel. The electrical signal source is coupled to an electrode pair in the channel to generate an electric field to associate at least one nanowire from the suspension with the electrode pair. The deposition system may include various further features, including being configured to receive multiple solution types, having various electrode geometries, having a rotatable flow channel, having additional electrical conductors, and further aspects.