The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2016
Filed:
Feb. 06, 2015
Applicant:
Sandisk Technologies Inc., Plano, TX (US);
Inventor:
Takuya Sakurai, Yokkaichi, JP;
Assignee:
SanDisk Technologies LLC, Plano, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/033 (2006.01); H01L 21/308 (2006.01); H01L 21/02 (2006.01); H01L 27/115 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0337 (2013.01); H01L 21/02532 (2013.01); H01L 21/02664 (2013.01); H01L 21/3086 (2013.01); H01L 27/11517 (2013.01); H01L 27/11563 (2013.01);
Abstract
Sidewall spacers formed on sides of mandrels are separated by first gaps in a first region and separated by wider second gaps in a second region. The second gaps are filled while a capping layer caps the first gaps. The capping layer is etched thereby exposing mandrels in the first region, which are removed. An underlying layer is patterned using the sidewall spacers separated by first gaps to form word lines in the first region and using sidewall spacers with filled second gaps to form select lines in the second region.