The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2016
Filed:
Sep. 02, 2014
Applicant:
Leidos, Inc., Reston, VA (US);
Inventors:
Charles Stephen Harden, Bel Air, MD (US);
Robert James Schafer, Port Deposit, MD (US);
Assignee:
Leidos, Inc., Reston, VA (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 49/00 (2006.01); H01J 49/02 (2006.01); G01N 27/62 (2006.01); H01J 49/40 (2006.01);
U.S. Cl.
CPC ...
H01J 49/0095 (2013.01); G01N 27/622 (2013.01); G01N 27/624 (2013.01); H01J 49/004 (2013.01); H01J 49/005 (2013.01); H01J 49/009 (2013.01); H01J 49/0013 (2013.01); H01J 49/0022 (2013.01); H01J 49/40 (2013.01);
Abstract
Two complementary approaches to the science of IMS technology, IMS and differential IMS (DIMS), are combined into a single instrument to provide improvements in interference rejection without sacrificing detection sensitivity. The technology is applicable to, inter alia, the analysis of trace quantities of toxic or otherwise dangerous organic chemical materials. The approach improves both sensitivity and specificity (interference rejection) of field detection instrumentation.