The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2016

Filed:

Mar. 12, 2013
Applicants:

Jin-kwang Kim, Yongin, KR;

Seung-yong Song, Yongin, KR;

Myung-soo Huh, Yongin, KR;

Suk-won Jung, Yongin, KR;

Choel-min Jang, Yongin, KR;

Jae-hyun Kim, Yongin, KR;

Sung-chul Kim, Yongin, KR;

Inventors:

Jin-Kwang Kim, Yongin, KR;

Seung-Yong Song, Yongin, KR;

Myung-Soo Huh, Yongin, KR;

Suk-Won Jung, Yongin, KR;

Choel-Min Jang, Yongin, KR;

Jae-Hyun Kim, Yongin, KR;

Sung-Chul Kim, Yongin, KR;

Assignee:

SAMSUNG DISPLAY CO., LTD., Yongin, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); H01B 13/30 (2006.01); C23C 14/24 (2006.01); C23C 14/56 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01B 13/30 (2013.01); C23C 14/24 (2013.01); C23C 14/564 (2013.01); C23C 16/4401 (2013.01); C23C 16/45536 (2013.01); C23C 16/45551 (2013.01);
Abstract

A vapor deposition apparatus in which a deposition process is performed by moving a substrate, the vapor deposition apparatus including a supply unit that injects at least one raw material gas towards the substrate, and a blocking gas flow generation unit that is disposed corresponding to the supply unit and generates a gas-flow that blocks a flow of the raw material gas.


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