The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2016
Filed:
Feb. 12, 2015
Applicant:
Chi Mei Corporation, Tainan, TW;
Inventors:
Wei-Jie Huang, Taipei, TW;
Chun-An Shih, Tainan, TW;
Assignee:
Chi Mei Corporation, Tainan, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/075 (2006.01); C08L 83/04 (2006.01); C08L 83/10 (2006.01); C09D 183/04 (2006.01); C09D 183/06 (2006.01); C08G 77/06 (2006.01); C08G 77/18 (2006.01); G03F 7/022 (2006.01); G03F 7/023 (2006.01); G03F 7/038 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0757 (2013.01); C08G 77/06 (2013.01); C08G 77/18 (2013.01); C08L 83/04 (2013.01); C08L 83/10 (2013.01); C09D 183/04 (2013.01); C09D 183/06 (2013.01); G03F 7/0226 (2013.01); G03F 7/0233 (2013.01); G03F 7/038 (2013.01);
Abstract
A photosensitive polysiloxane composition, a protecting film and an element having the protecting film are provided. The photosensitive polysiloxane composition includes a polysiloxane (A), an o-naphthoquinonediazidesulfonate (B), a silane compound (C) containing an amic acid group and a solvent (D). When the photosensitive polysiloxane composition is used for forming a protecting film, the protecting film shows favorable cross-section shape and heat resistance.