The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2016

Filed:

May. 12, 2014
Applicant:

Semiconductor Energy Laboratory Co., Ltd., Atsugi-shi, Kanagawa-ken, JP;

Inventors:

Shunpei Yamazaki, Tokyo, JP;

Hisashi Ohtani, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/417 (2006.01); H01L 29/786 (2006.01); G02F 1/1362 (2006.01); H01L 29/04 (2006.01); H01L 29/66 (2006.01); H01L 27/12 (2006.01); G02F 1/1345 (2006.01);
U.S. Cl.
CPC ...
G02F 1/136286 (2013.01); H01L 27/1255 (2013.01); H01L 27/1277 (2013.01); H01L 29/04 (2013.01); H01L 29/045 (2013.01); H01L 29/66757 (2013.01); H01L 29/78675 (2013.01); G02F 1/13454 (2013.01); G11B 2220/2545 (2013.01);
Abstract

A semiconductor device includes TFTs designed in accordance with characteristics of circuits. In a first structure of the invention, the TFT is formed by using a crystalline silicon film made of a unique crystal structure body. The crystal structure body has a structure in which rod-like or flattened rod-like crystals grow in a direction parallel to each other. In a second structure of the invention, growth distances of lateral growth regions are made different from each other in accordance with channel lengths, of the TFTs. By this, characteristics of TFTs formed in one lateral growth region can be made as uniform as possible.


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