The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2016

Filed:

Feb. 05, 2014
Applicant:

Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;

Inventors:

Hoon Kang, Suwon-si, KR;

Jae-Sung Kim, Suwon-si, KR;

Jin-Young Choi, Incheon, KR;

Koichi Sugitani, Hwaseong-si, KR;

Ki-Hyun Cho, Suwon-si, KR;

Jin Ho Ju, Seoul, KR;

Byung-Uk Kim, Hwaseong-si, KR;

Joo-Pyo Yun, Hwaseong-si, KR;

Hyoc-Min Youn, Hwaseong-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 19/00 (2006.01); G02F 1/1333 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133345 (2013.01); G03F 7/0045 (2013.01); Y10T 428/10 (2015.01); Y10T 428/1059 (2015.01); Y10T 428/1077 (2015.01);
Abstract

A photosensitive resin composition is disclosed. The disclosed photosensitive resin composition includes an acryl-based copolymer formed by copolymerizing i) unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, or a mixture thereof, and ii) an olefin-based unsaturated compound or a mixture thereof, a dissolution inhibitor in which a phenolic hydroxyl group is protected by an acid-degradable acetal or ketal group, a photoacid generator, and a solvent.


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