The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2016
Filed:
Apr. 24, 2014
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventors:
Kazumichi Nakahama, Tokyo, JP;
Keiichiro Tsubaki, Tokyo, JP;
Takayuki Hiratani, Tokyo, JP;
Akira Kuriyama, Atsugi, JP;
Taku Shimoda, Machida, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 220/12 (2006.01); C08F 220/18 (2006.01); C08F 218/02 (2006.01); C08F 220/44 (2006.01); C08F 212/08 (2006.01); C08F 220/14 (2006.01); C08F 218/12 (2006.01);
U.S. Cl.
CPC ...
C08F 220/44 (2013.01); C08F 212/08 (2013.01); C08F 218/12 (2013.01); C08F 220/14 (2013.01);
Abstract
A method for producing a resin composition, comprising the step of: subjecting a radical copolymerization of a first radical polymerizable monomer which is free from any crystalline molecular chain and a second radical polymerizable monomer having a crystalline molecular chain, in the presence of a radical polymerization initiator, (wherein Rdenotes a hydrogen atom or a methyl group, and Rdenotes an alkyl group having at least 17 carbon atoms) the first radical polymerizable monomer has a particular reactivity ratio.