The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 12, 2016
Filed:
Nov. 17, 2014
Applicant:
Sandia Corporation, Albuquerque, NM (US);
Inventors:
Leo J. Small, Albuquerque, NM (US);
Erik David Spoerke, Albuquerque, NM (US);
David R. Wheeler, Albuquerque, NM (US);
Assignee:
Sandia Corporation, Albuquerque, NM (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 71/50 (2006.01); B01D 69/02 (2006.01); B01D 67/00 (2006.01);
U.S. Cl.
CPC ...
B01D 69/02 (2013.01); B01D 67/0034 (2013.01); B01D 67/0093 (2013.01); B01D 71/50 (2013.01); B01D 2325/021 (2013.01); B01D 2325/42 (2013.01);
Abstract
A pressure-based chemical etch method is used to shape polymer nanopores into cones. By varying the pressure, the pore tip diameter can be controlled, while the pore base diameter is largely unaffected. The method provides an easy, low-cost approach for conically etching high density nanopores.