The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 05, 2016

Filed:

Jul. 17, 2014
Applicant:

Georges J. Gorin, Novato, CA (US);

Inventor:

Georges J. Gorin, Novato, CA (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 10/00 (2006.01); H05H 1/24 (2006.01);
U.S. Cl.
CPC ...
H05H 1/24 (2013.01);
Abstract

An apparatus and method to concentrate a plasma from one or more plasma sources through at least one pathway. A first embodiment of the invention involves a method to concentrate a plasma for treating one or more articles with a selectively concentrated plasma generated from dissociating one or more gases, the method includes supplying one or more gases from a source to a first chamber; applying RF power to dissociate the one or more gases and create a plasma; withdrawing the dissociated one or more gases from the first chamber through at least one pathway; and supplying the dissociated one or more gases to a treatment chamber containing one or more articles, wherein the at least one pathway selectively concentrates the plasma in the at least one pathway by using a narrower pathway with a volume smaller than the treatment chamber to restrict the diffusion of the plasma to concentrate the plasma. A second embodiment of the invention involves an apparatus to concentrate a plasma to treat one or more articles.


Find Patent Forward Citations

Loading…