The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 05, 2016

Filed:

Sep. 28, 2015
Applicants:

Satoshi Mizukami, Kanagawa, JP;

Takahiko Kuroda, Hyogo, JP;

Masahiro Ishimori, Tokyo, JP;

Inventors:

Satoshi Mizukami, Kanagawa, JP;

Takahiko Kuroda, Hyogo, JP;

Masahiro Ishimori, Tokyo, JP;

Assignee:

RICOH COMPANY, LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/045 (2006.01); H01L 41/08 (2006.01); H01L 41/18 (2006.01); B41J 2/14 (2006.01); H01L 41/083 (2006.01);
U.S. Cl.
CPC ...
H01L 41/0805 (2013.01); B41J 2/14233 (2013.01); H01L 41/18 (2013.01); B41J 2/14201 (2013.01); B41J 2/14274 (2013.01); H01L 41/08 (2013.01); H01L 41/083 (2013.01); H01L 41/0831 (2013.01);
Abstract

An electromechanical conversion element includes a lower electrode formed directly or indirectly on a substrate or a base film; an electromechanical conversion film formed on the lower electrode and including a piezoelectric body having a perovskite crystal structure preferentially oriented with a {n00} plane where n is a positive integer; and an upper electrode formed on the electromechanical conversion film. A diffraction peak at a position 2θ at which a diffraction intensity has a maximum value and which corresponds to a (X00) plane or a (00X) plane, X being 1 or 2, obtained by θ-2θ measurement in X-ray diffraction measurement, shows a trapezoidal peak shape and has two or more bending points.


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