The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 05, 2016

Filed:

Mar. 22, 2012
Applicants:

Andrew Michael Christian Smout, Edinburgh, GB;

Daniel Neil William Phillips, Edinburgh, GB;

Inventors:
Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 17/00 (2006.01); G06T 19/00 (2011.01); G06T 15/08 (2011.01);
U.S. Cl.
CPC ...
G06T 19/00 (2013.01); G06T 15/08 (2013.01); G06T 2210/41 (2013.01);
Abstract

A computer implemented method of generating a succession of two-dimensional image frames for a slab cine multi-planar reformatting (MPR) process by advancing a slab through a volume defined by a volume data set, including receiving a volume data set defining a volume; specifying a view axis with respect to the volume; advancing a slab through the volume along the view axis in incremental step sizes smaller than the slab thickness; and determining at each slab position an MPR view by: selecting a plurality of sample points along each of a plurality of rays cast through the slab, and performing a projection of the sample points on to an image plane using an a projection function, wherein at least some of the sample points used for the overlap region are re-used from the previous slab position.


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