The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2016
Filed:
Aug. 11, 2008
Applicant:
Julian Kamibayashiyama, San Diego, CA (US);
Inventor:
Julian Kamibayashiyama, San Diego, CA (US);
Assignee:
Parker-Hannifin Corporation, Cleveland, OH (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F16K 25/00 (2006.01); F16K 31/44 (2006.01); F16K 51/02 (2006.01); F16K 3/02 (2006.01); F16K 3/16 (2006.01);
U.S. Cl.
CPC ...
F16K 51/02 (2013.01); F16K 3/0227 (2013.01); F16K 3/16 (2013.01);
Abstract
The present invention provides a thin film spacer for maintaining a gap between a slit valve door and a sealing surface of a slit valve, such as a metallic insert. The film spacer can extend the life of a seal by limiting the line of sight exposure of the seal to corrosive gases within a wafer processing chamber, for example, and by controlling the compression percentage of the seal. The spacer may be located on an outer ambient side of the slit valve away from any corrosive gasses that may exist in the chamber.