The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2016
Filed:
Mar. 13, 2013
California Institute of Technology, Pasadena, CA (US);
The University of Massachusetts, Boston, MA (US);
Yan Xia, Quincy, MA (US);
Benjamin R Sveinbjornsson, Pasadena, CA (US);
Robert H Grubbs, South Pasadena, CA (US);
Raymond Weitekamp, Glendale, CA (US);
Garret M Miyake, Pasadena, CA (US);
Harry A Atwater, South Pasadena, CA (US);
Victoria Piunova, Altadena, CA (US);
Christopher Scot Daeffler, Pasadena, CA (US);
Sung Woo Hong, Seoul, KR;
Weiyin Gu, Amherst, MA (US);
Thomas P. Russell, Amherst, MA (US);
CALIFORNIA INSTITUTE OF TECHNOLOGY, Pasadena, CA (US);
Abstract
The invention provides a class of copolymers having useful properties, including brush block copolymers, wedge-type block copolymers and hybrid wedge and polymer block copolymers. In an embodiment, for example, block copolymers of the invention incorporate chemically different blocks comprising polymer size chain groups and/or wedge groups that significantly inhibit chain entanglement, thereby enhancing molecular self-assembly processes for generating a range of supramolecular structures, such as periodic nanostructures and microstructures. The present invention also provides useful methods of making and using copolymers, including block copolymers.