The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2016
Filed:
Jul. 15, 2014
GM Global Technology Operations Llc, Detroit, MI (US);
GM Global Technology Operations LLC, Detroit, MI (US);
Abstract
In an example method, a transition metal precursor is selected so its transition metal has a diffusion rate that is slower than a diffusion rate of silicon. An aqueous mixture is formed by dissolving the precursor in an aqueous medium, and adding silicon particles to the medium. The mixture is exposed to a hydroxide, which forms a product including the silicon particles and a transition metal hydroxide precipitate. The product is dried. In an inert or reducing environment, silicon atoms of the silicon particles in the dried product are caused to diffuse out of, and form voids in and/or at a surface of, the particles. At least some silicon atoms react with the transition metal hydroxide in the dried product to form i) a SiO(0<x≦2) coating on the silicon particles and ii) the transition metal, which reacts with other silicon atoms to form silicides.