The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2016
Filed:
Mar. 10, 2015
Globalfoundries Inc., Grand Cayman, KY;
Byeong Y. Kim, Lagrangeville, NY (US);
GlobalFoundries, Inc., Grand Cayman, KY;
Abstract
A method including forming a buffer layer between a top pad layer and a bottom pad layer all above a deep trench capacitor embedded in a substrate, forming a fin pattern, defined by one or more sidewall spacers, above the top pad layer using a sidewall image transfer technique, transferring the fin pattern into the top pad layer stopping of the buffer layer, and forming a fin in direct contact with a strap by transferring the fin pattern into the buffer layer, into the bottom pad layer, and into the substrate and an inner electrode of the deep trench capacitor, the fin is formed from a portion of the substrate and the strap is formed from a portion of the inner electrode of the deep trench capacitor.