The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 28, 2016

Filed:

Aug. 20, 2015
Applicant:

Samsung Display Co., Ltd., Yongin-si, Gyeonggi-do, KR;

Inventors:

Sunmi Kang, Yongin-si, KR;

Kyongho Park, Yongin-si, KR;

Raechul Park, Yongin-si, KR;

Donghoon Shin, Yongin-si, KR;

Kwanghyun You, Yongin-si, KR;

Hongro Lee, Yongin-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/36 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02675 (2013.01); H01L 21/02532 (2013.01); H01L 21/02592 (2013.01);
Abstract

A method of manufacturing a display apparatus, the method including forming an amorphous silicon layer on a substrate, placing the substrate with the amorphous silicon layer in a chamber having a window on an upper portion thereof, and directing a laser beam toward the window, and converting the amorphous silicon layer into a polycrystalline silicon layer by irradiating the amorphous silicon layer with the laser beam while nitrogen gas is discharged from a nozzle located adjacent to an opening of a stabilizing room, wherein the laser beam reaches the amorphous silicon layer on the substrate after passing through the window, the stabilization room, and the opening of the stabilization room, wherein the opening faces the substrate.


Find Patent Forward Citations

Loading…