The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 28, 2016

Filed:

Dec. 11, 2014
Applicants:

Excelio Technology (Shenzhen) Co., Ltd., Shenzhen, Guangdong Province, CN;

Wuxi Excelio Technology Co., Ltd., Wuxi, Jiangsu Province, CN;

Inventor:

Patrick Bian Wu, Shenzhen, CN;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5036 (2013.01); G06F 17/5045 (2013.01);
Abstract

The present invention relates to a field of semiconductor design technologies. The present invention implements a sweep simulation method in which process corners are continuously swept in a simulation job, and a process corner a field is used as an independent variable, so that a simulation program outputs a waveform chart using the parameter values of the device model under various process corner conditions or performance response values of a testbench circuit under various process corner conditions as dependent variables. Thereby, parameter deviations of the device model and performance deviations of the testbench circuit under various process corner conditions are presented in a same coordinate system, and visual technical references are provided for a designer, and process deviations are properly taken into account in a circuit design, and possible fatal defects of the circuit design caused by a process deviation impact are avoided, and a processing procedure of the simulation program is greatly simplified, and efficiency of research and development of the designer is improved.


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