The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2016
Filed:
Jan. 21, 2015
Canon Kabushiki Kaisha, Tokyo, JP;
Akihiko Kawamura, Tokyo, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
A method of performing patterning of a substrate includes: obtaining, based on first alignment measurement with respect to first patterning, a first compensation value for second alignment measurement, with respect to the first patterning, in which number of alignment marks to be measured is smaller than number of alignment marks to be measured in the first alignment measurement; performing the second alignment measurement with respect to second patterning different from the first patterning; generating, based on a condition with respect to the second patterning and the first compensation value, a second compensation value for the second alignment measurement; and performing the second patterning of a substrate based on the second alignment measurement and the second compensation value.