The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 28, 2016

Filed:

Feb. 15, 2013
Applicant:

Sicrystal Ag, Nuremberg, DE;

Inventors:

Thomas Ludwig Straubinger, Mohrendorf, DE;

Michael Vogel, Nuremberg, DE;

Andreas Wohlfart, Baiersdorf, DE;

Erwin Schmitt, Grobenseebach, DE;

Assignee:

SiCrystal AG, Nuremberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 23/06 (2006.01); C30B 23/02 (2006.01); C30B 23/00 (2006.01); C30B 29/36 (2006.01);
U.S. Cl.
CPC ...
C30B 23/02 (2013.01); C30B 23/005 (2013.01); C30B 23/06 (2013.01); C30B 29/36 (2013.01);
Abstract

The present invention relates to a configuration and in particular a physical vapor transport growth system for simultaneously growing more than one silicon carbide (SiC) bulk crystal. Furthermore, the invention relates to a method for producing such a bulk SiC crystal. A physical vapor transport growth system for simultaneously growing more than one SiC single crystal boule comprises a crucible containing two growth compartments for arranging at least one SiC seed crystal in each of them, and a source material compartment for containing a SiC source material, wherein said source material compartment is arranged symmetrically between said growth compartments and is separated from each of the growth compartments by a gas permeable porous membrane.


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