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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9376581 B1

PDFFull Text
Date of Patent:
Jun. 28, 2016

Filed:

Sep. 11, 2014

Photo-curable composition for imprints, pattern forming method and pattern

Applicant:

Fujifilm Corporation, Minato-ku, Tokyo, JP;

Inventors:

Hirotaka Kitagawa, Haibara-gun, JP;

Masafumi Yoshida, Haibara-gun, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Ling Choi

Assistant Examiner:

Jessica E Whiteley

Int. Cl.
CPC ...
C08F 2/46 (2006.01); C08F 2/50 (2006.01); C08G 61/04 (2006.01); C09D 11/101 (2014.01); C08F 220/18 (2006.01); C08F 236/20 (2006.01); C08F 2/48 (2006.01); G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/027 (2006.01); B05D 5/00 (2006.01); B29C 59/00 (2006.01); B29C 59/16 (2006.01); H01L 21/027 (2006.01); H01L 21/308 (2006.01); B29K 33/00 (2006.01); C08F 220/58 (2006.01); C08F 220/32 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
C09D 11/101 (2013.01); B05D 5/00 (2013.01); B29C 59/005 (2013.01); B29C 59/16 (2013.01); C08F 2/48 (2013.01); C08F 220/18 (2013.01); C08F 236/20 (2013.01); G03F 7/0002 (2013.01); G03F 7/0046 (2013.01); G03F 7/027 (2013.01); H01L 21/0274 (2013.01); H01L 21/3086 (2013.01); B29K 2033/12 (2013.01); C08F 220/58 (2013.01); C08F 2220/325 (2013.01); H01L 21/31138 (2013.01); H01L 21/31144 (2013.01); Y10T 428/24802 (2015.01);
Abstract

To provide a photo-curable composition for imprints which can ensure high ratio of mold filling and low defect density during mold releasing, and can provide a resist material with high etching durability. A photo-curable composition for imprints comprising a monofunctional monomer, a polyfunctional monomer and a photo-polymerization initiator, having a viscosity at 25° C. of 15 mPa·s or smaller, an Ohnishi parameter of 3.0 or smaller, and a crosslink density calculated by (Formula 1) of 0.6 mmol/cmor larger;Crosslink density={Σ(Ratio of mixing of polyfunctional monomer (parts by mass)*Number of functional groups of polyfunctional monomer/Molecular weight of polyfunctional monomer)}/Specific gravity.

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