The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 21, 2016

Filed:

Jul. 16, 2012
Applicants:

Chul Lee, Seoul, KR;

Byungkil Lim, Seoul, KR;

Myungwhoon Lee, Seoul, KR;

Jonghyun Byeon, Seoul, KR;

Jaeho Kim, Seoul, KR;

Jeongrok Lee, Seoul, KR;

Hyunbyung Cha, Seoul, KR;

Yongho Lee, Seoul, KR;

Inventors:

Chul Lee, Seoul, KR;

Byungkil Lim, Seoul, KR;

Myungwhoon Lee, Seoul, KR;

Jonghyun Byeon, Seoul, KR;

Jaeho Kim, Seoul, KR;

Jeongrok Lee, Seoul, KR;

Hyunbyung Cha, Seoul, KR;

Yongho Lee, Seoul, KR;

Assignee:

LG ELECTRONICS INC., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 5/02 (2006.01); F16M 11/08 (2006.01); F16M 11/22 (2006.01); H01F 7/02 (2006.01); H05K 5/00 (2006.01); F16M 11/42 (2006.01); H04N 5/64 (2006.01);
U.S. Cl.
CPC ...
H05K 5/0234 (2013.01); F16M 11/08 (2013.01); F16M 11/22 (2013.01); F16M 11/42 (2013.01); H01F 7/0247 (2013.01); H05K 5/0017 (2013.01); F16M 2200/08 (2013.01); H04N 5/64 (2013.01);
Abstract

A display apparatus according to the embodiment of the present invention includes a display body outputting an image signal; a stand supporting the display body and disposed on an installing surface; and a swivel member disposed in a bottom part of the stand and rotating the stand at a certain angle in a status where the stand is disposed on the installing surface, wherein the swivel member, includes a plurality of rotatable rolling members mounted in the bottom part of the stand, and the plurality of rolling members have the same revolution center.


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