The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2016
Filed:
Nov. 06, 2014
General Electric Company, Schenectady, NY (US);
Hewei Gao, Pewaukee, WI (US);
Girijesh Kumar Yadava, Waukesha, WI (US);
Adam Israel Cohen, Milwaukee, WI (US);
Yannan Jin, Niskayuna, NY (US);
General Electric Company, Niskayuna, NY (US);
Abstract
A method includes acquiring projection data of an object from a plurality of detector elements, reconstructing the acquired projection data into a first reconstructed image, and performing material characterization of an image volume of the first reconstructed image to reduce a number of materials analyzed in the image volume to two basis materials. Performing material characterization includes utilizing a generalized modeling function to estimate a fraction of at least one basis material within each voxel of the image volume. The method also includes generating a re-mapped image volume for the at least one basis material of the two basis materials, performing forward projection on at least the re-mapped image volume for the at least one basis material to produce a material-based projection, and generating multi-material corrected projections based on the material-based projection and a total projection attenuated by the object, which represents both of the two basis materials.