The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2016
Filed:
Dec. 04, 2014
Imec Vzw, Leuven, BE;
IMEC VZW, Leuven, BE;
Abstract
A method for creating a pattern on a substrate () is presented, the method comprises: providing a substrate () comprising silicon; creating a sacrificial layer () on the substrate (), wherein the sacrificial layer is formed on a first surface area () of the substrate thereby leaving a second surface area () exposed; depositing a first functional layer () at least on the second surface area () of the substrate (); removing the sacrificial layer (); wherein: removing the sacrificial layer () is performed by etching the sacrificial layer () with an acidic aqueous solution that does not adversely affect the first functional layer () and the substrate ().
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