The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2016
Filed:
Nov. 21, 2013
Applicant:
Seoul Viosys Co., Ltd., Ansan-si, KR;
Inventors:
Joo Won Choi, Ansan-si, KR;
Chang Yeon Kim, Ansan-si, KR;
Jeong Hoon Heo, Ansan-si, KR;
Young Wug Kim, Ansan-si, KR;
Su Yeon Hong, Ansan-si, KR;
Sang Wan Ryu, Gwangju, KR;
Assignee:
Seoul Viosys Co., Ltd., Ansan-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/02 (2006.01); H01L 29/20 (2006.01); H01L 33/00 (2010.01);
U.S. Cl.
CPC ...
H01L 21/02032 (2013.01); H01L 21/02013 (2013.01); H01L 21/02019 (2013.01); H01L 29/2003 (2013.01); H01L 33/0079 (2013.01); H01L 33/007 (2013.01);
Abstract
Exemplary embodiments of the present invention provide a substrate recycling method and a recycled substrate. The method includes separating a substrate having a first surface from an epitaxial layer, performing a first etching of the first surface using electrochemical etching, and performing, after the first etching, a second etching of the first surface using chemical etching, dry etching, or performing, after the first etching, chemical mechanical polishing of the first surface.