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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9373484 B1

PDFFull Text
Date of Patent:
Jun. 21, 2016

Filed:

Aug. 10, 2012

Plasma generator, manufacturing method of rotating electrode for plasma generator, method for performing plasma treatment of substrate, and method for forming thin film having mixed structure by using plasma

Applicants:

Kee-seok Nam, Gyeongsangnam-do, KR;

Jung-dae Kwon, Gyeongsangnam-do, KR;

Yong Soo Jeong, Gyeongsangnam-do, KR;

Gun Hwan Lee, Gyeonggi-do, KR;

Jung Heum Yoon, Gyeongsangnam-do, KR;

Sung Hun Lee, Gyeongsangnam-do, KR;

Dong Ho Kim, Gyeongsangnam-do, KR;

Jae Wook Kang, Gyeongsangnam-do, KR;

Sung Gyu Park, Gyeongsangnam-do, KR;

Chang Su Kim, Gyeongsangnam-do, KR;

Inventors:

Kee-Seok Nam, Gyeongsangnam-do, KR;

Jung-Dae Kwon, Gyeongsangnam-do, KR;

Yong Soo Jeong, Gyeongsangnam-do, KR;

Gun Hwan Lee, Gyeonggi-do, KR;

Jung Heum Yoon, Gyeongsangnam-do, KR;

Sung Hun Lee, Gyeongsangnam-do, KR;

Dong Ho Kim, Gyeongsangnam-do, KR;

Jae Wook Kang, Gyeongsangnam-do, KR;

Sung Gyu Park, Gyeongsangnam-do, KR;

Chang Su Kim, Gyeongsangnam-do, KR;

Assignee:

KOREA INSTITUTE OF MACHINERY & MATERIALS, Daejeon, KR;

Attorney:

Ladas & Parry LLP

Primary Examiner:

Mary Ellen Bowman

Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/509 (2006.01); H05H 1/24 (2006.01); H01J 9/02 (2006.01); C23C 16/503 (2006.01); H05H 1/48 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32541 (2013.01); C23C 16/503 (2013.01); C23C 16/509 (2013.01); H01J 9/022 (2013.01); H01J 37/32559 (2013.01); H01J 37/32568 (2013.01); H01J 37/32825 (2013.01); H05H 1/2406 (2013.01); H01J 2237/327 (2013.01); H05H 2001/2431 (2013.01); H05H 2001/485 (2013.01); H05H 2001/486 (2013.01);
Abstract

A plasma generator according to an embodiment of the present invention is provided to generate a high density and stable plasma at near atmospheric pressure by preventing a transition of plasma to arc. The plasma generator includes a plate-shaped lower electrode for seating a substrate; and a cylindrical rotating electrode on the plate-shaped lower electrode, wherein the cylindrical rotating electrode includes an electrically conductive body that is connected to a power supply and includes a plurality of capillary units on an outer circumferential surface of the electrically conductive body; and an insulation shield layer that is made of an insulation material or a dielectric material, exposes a lower surface of the plurality of capillary units, and shields other parts.

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