The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2016
Filed:
Jul. 06, 2012
Applicants:
Paul Franklin Nealey, Madison, WI (US);
Shengxiang Ji, Changchun, CN;
Inventors:
Paul Franklin Nealey, Madison, WI (US);
Shengxiang Ji, Changchun, CN;
Assignee:
Wisconsin Alumni Research Foundation, Madison, WI (US);
Primary Examiner:
Int. Cl.
CPC ...
B32B 27/28 (2006.01); B32B 33/00 (2006.01); B05D 3/10 (2006.01); G03F 7/00 (2006.01); B81C 1/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); B81C 1/00031 (2013.01); B81C 2201/0149 (2013.01); Y10T 428/24851 (2015.01);
Abstract
Provided herein are block copolymer thin film structures and methods of fabrication. The methods involve directing the assembly of ABA triblock copolymers such that desired features are formed by domains of the assembled ABA triblock copolymer. In some embodiments, an ABA triblock copolymer is directed to assemble by a chemical pattern. Chemical patterns with periods much different than the natural period of the ABA triblock copolymer may be used to direct assembly of the ABA triblock copolymer.