The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 21, 2016

Filed:

Jan. 26, 2015
Applicant:

Nitto Denko Corporation, Osaka, JP;

Inventors:

Naoyuki Matsuo, Osaka, JP;

Takeshi Sutou, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1337 (2006.01); C09K 19/20 (2006.01); C09K 19/24 (2006.01); C09K 19/38 (2006.01); B05D 3/06 (2006.01); C09D 135/02 (2006.01);
U.S. Cl.
CPC ...
G02F 1/133788 (2013.01); B05D 3/067 (2013.01); C08L 2312/06 (2013.01); C09K 19/24 (2013.01); C09K 2019/2035 (2013.01); C09K 2019/2078 (2013.01);
Abstract

The present invention relates to a method for manufacturing a photo-responsive cross-linked liquid-crystalline polymer film, containing: a process of preparing a photopolymerizable monomer solution by dissolving in a solvent a polyfunctional liquid-crystalline monomer, a monofunctional liquid-crystalline monomer, a polyfunctional photo-responsive monomer and a photopolymerization initiator; a process of forming a photopolymerizable coating by applying the photopolymerizable monomer solution to a surface of an alignment film by means of a wet coating method and performing removal of the solvent; and a process of forming a film by photopolymerizing the monomers through light irradiation of the photopolymerizable coating under a non-oxygen atmosphere.


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