The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2016
Filed:
Nov. 14, 2014
Raytheon Company, Waltham, MA (US);
John F. Silny, Playa Vista, CA (US);
Stephen J. Schiller, La Miranda, CA (US);
Raytheon Company, Waltham, MA (US);
Abstract
Described are methods and systems for vicarious polarimetric calibration and performance validation of a remote sensor. The system includes a plurality of reflective mirrors configured and arranged to reflect radiation from a source of radiation onto the remote sensor with accurately known polarimetric properties. Each of the reflective mirrors are located so that the target images do not overlap. The remote sensor is configured to receive the radiation reflected from the plurality of reflective mirrors and store the received radiation as image data (e.g., the image of each mirror appears as a point target). The system includes a processor configured to process the received data to provide direct calibration and performance validation for each polarimetric or spectral channel of the remote sensor. In addition, the calibration method removes all atmospheric effects except for transmittance and provides reference targets that have high polarimetric contrast, full spectrum performance and easy to deploy.