The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2016
Filed:
Mar. 03, 2011
Applicants:
Sönke Siebels, Hamburg, DE;
Sebastian Kytzia, Hamburg, DE;
Inventors:
Sönke Siebels, Hamburg, DE;
Sebastian Kytzia, Hamburg, DE;
Assignee:
KHS CORPOPLAST GMBH, Hamburg, DE;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/52 (2006.01); C23C 16/04 (2006.01); C23C 16/511 (2006.01); G01J 3/02 (2006.01); G01J 3/443 (2006.01); G01N 21/68 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/52 (2013.01); C23C 16/045 (2013.01); C23C 16/511 (2013.01); G01J 3/02 (2013.01); G01J 3/0218 (2013.01); G01J 3/443 (2013.01); G01N 21/68 (2013.01); H01J 37/32192 (2013.01); H01J 37/32779 (2013.01); H01J 37/32935 (2013.01);
Abstract
The method and device are used to plasma-treat workpieces. The workpiece is inserted into a chamber of a treatment station that can be at least partially evacuated. The plasma chamber is bounded by a chamber bottom, a chamber cover, and a lateral chamber wall. The method process is optically monitored at least at times. In the optical monitoring, spectral lines of the radiation of the plasma above 500 nanometers are evaluated. Preferably, the evaluation is performed for frequencies above 700 nanometers.