The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2016
Filed:
Oct. 13, 2009
Applicants:
Ki Jong Kim, Daejeon-si, KR;
Hyun Kyu Cho, Daejeon-si, KR;
Jin Su Lee, Daejeon-si, KR;
SE Yong Kim, Daejeon-si, KR;
Inventors:
Ki Jong Kim, Daejeon-si, KR;
Hyun Kyu Cho, Daejeon-si, KR;
Jin Su Lee, Daejeon-si, KR;
Se Yong Kim, Daejeon-si, KR;
Assignee:
ASM GENITECH KOREA LTD., Cheonan-Si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/455 (2006.01); C23C 16/509 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45551 (2013.01); C23C 16/45542 (2013.01); C23C 16/5096 (2013.01); H01J 37/32009 (2013.01); H01J 37/32091 (2013.01); H01J 37/32146 (2013.01); H01J 37/32568 (2013.01); H01J 37/32733 (2013.01);
Abstract
A deposition apparatus according to an exemplary embodiment of the present invention includes a plurality of reaction spaces, a plurality of plasma electrodes respectively disposed in the reaction spaces, a first plasma processor connected to at least two plasma electrodes, and a first plasma power source connected to the first plasma processor. The first plasma processor may include a plasma distributor or a plasma splitter.