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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9371577 B1

PDFFull Text
Expired
Date of Patent:
Jun. 21, 2016

Filed:

Mar. 14, 2014

Fabrication of integrated computational elements using substrate support shaped to match spatial profile of deposition plume

Applicant:

Halliburton Energy Services, Inc., Houston, TX (US);

Inventors:

David L. Perkins, The Woodlands, TX (US);

Robert Paul Freese, Pittsboro, NC (US);

Christopher Michael Jones, Houston, TX (US);

Richard Neal Gardner, Raleigh, NC (US);

Assignee:

Halliburton Energy Services, Inc., Houston, TX (US);

Attorneys:

Benjamin Fite

Fish & Richardson P.C.

Primary Examiner:

Binu Thomas

Int. Cl.
CPC ...
C23C 14/50 (2006.01); C23C 14/24 (2006.01); C23C 16/00 (2006.01); C23C 14/54 (2006.01); G01N 21/25 (2006.01); E21B 47/00 (2012.01); G01J 3/00 (2006.01); G01N 21/31 (2006.01); G06E 3/00 (2006.01); C23C 14/10 (2006.01);
U.S. Cl.
CPC ...
C23C 14/505 (2013.01); C23C 14/24 (2013.01); C23C 14/50 (2013.01); C23C 14/54 (2013.01); C23C 14/542 (2013.01); E21B 47/00 (2013.01); G01J 3/00 (2013.01); G01N 21/25 (2013.01); G01N 21/31 (2013.01); G06E 3/001 (2013.01); C23C 14/10 (2013.01); G01N 2021/317 (2013.01);
Abstract

A system includes a computational system to receive a design of an integrated computational element (ICE) including specification of a substrate and a plurality of layers, their respective target thicknesses and complex indices, such that a notional ICE fabricated based on the ICE design is related to a characteristic of a sample. Additionally, the system includes a deposition chamber including a deposition source to provide a deposition plume having a plume spatial profile, and a support to support a plurality of instances of the substrate during fabrication of a plurality of instances of the ICE. The support is spaced apart from the deposition source and has a shape that corresponds to the plume spatial profile, such that when the supported instances of the substrate are distributed over the support, thicknesses of instances of each of the deposited layers are substantially uniform across the plurality of instances of the ICE.

Find Patent Forward Citations

Perkins, David. (2016). Fabrication of integrated computational elements using substrate support shaped to match spatial profile of deposition plume (U.S. Patent No. 9371577). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9371577

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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