The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 14, 2016

Filed:

Dec. 03, 2013
Applicant:

Hyundai Motor Company, Seoul, KR;

Inventors:

Dae Hwan Chun, Gwangmyung-si, KR;

Jong Seok Lee, Suwon-si, KR;

Kyoung-Kook Hong, Hwaseong-si, KR;

Youngkyun Jung, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/075 (2012.01); H01L 29/15 (2006.01); H01L 29/872 (2006.01); H01L 29/66 (2006.01); H01L 29/861 (2006.01); H01L 29/16 (2006.01);
U.S. Cl.
CPC ...
H01L 29/872 (2013.01); H01L 29/1608 (2013.01); H01L 29/66143 (2013.01); H01L 29/8611 (2013.01);
Abstract

A schottky barrier diode includes an n− type epitaxial layer disposed at a first surface of an n+ type silicon carbide substrate, a plurality of n type pillar areas disposed in the n− type epitaxial layer at a first portion of a first surface of the n+ type silicon carbide substrate, a plurality of p+ areas disposed at a surface of the n− type epitaxial layer and separated from the n type pillar area, a schottky electrode disposed on the n− type epitaxial layer and the p+ area, and an ohmic electrode disposed at a second surface of the n+ type silicon carbide substrate. A doping density of the n type pillar area is larger than a doping density of the n− type epitaxial layer.


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