The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2016
Filed:
Jul. 24, 2013
Applicant:
Trumpf Huettinger Sp. Z.o.o., Zielonka, PL;
Inventors:
Pawel Ozimek, Warsaw, PL;
Andrzej Klimczak, Warsaw, PL;
Marcin Zelechowski, Warsaw, PL;
Marcin Golan, Warsaw, PL;
Assignee:
TRUMPF Huettinger Sp. z o. o., Zielonka, PL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 7/24 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3211 (2013.01); H01J 37/321 (2013.01); H01J 37/32174 (2013.01);
Abstract
An apparatus for generating and maintaining plasma for plasma processing using inductively coupled RF power. The apparatus includes a resonant circuit having a resonant capacitance and a resonant inductance, an excitation circuit for exciting the resonant circuit, and a coupling element for coupling RF power from the inductance into a plasma chamber.