The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 14, 2016

Filed:

Oct. 22, 2013
Applicant:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Inventors:

Kazutaka Takizawa, Kawasaki, JP;

Akira Watanabe, Kawasaki, JP;

Kaori Kimura, Yokohama, JP;

Takeshi Iwasaki, Inagi, JP;

Akihiko Takeo, Kokubunji, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/74 (2006.01); G11B 5/855 (2006.01); G11B 5/86 (2006.01);
U.S. Cl.
CPC ...
G11B 5/746 (2013.01); G11B 5/855 (2013.01); G11B 5/865 (2013.01);
Abstract

According to one embodiment, there is provided a method for forming a pattern including forming an island-like metal underlayer comprised of a first metal, a phase-separated release layer including a first metal, a second metal, and a metal oxide, a mask layer, and a resist layer on a processed layer in this order, forming a concave-convex pattern on the resist layer, transferring the pattern to the mask layer, the phase-separated release layer, and the processed layer in this order, dissolving the phase-separated release layer using a peeling liquid for dissolving the first metal and the second metal, and removing the mask layer from the processed layer to expose the concave-convex pattern.


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