The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2016
Filed:
Sep. 28, 2012
Microsoft Corporation, Redmond, WA (US);
Christian Herwarth Borgs, Boston, MA (US);
Michael Avraham Brautbar, Philadelphia, PA (US);
Jennifer Tour Chayes, Boston, MA (US);
Brendan James Lucier, Cambridge, MA (US);
MICROSOFT CORPORATION, Redmond, WA (US);
Abstract
An influence maximization process efficiently identifies an influential set of nodes with which to seed a diffusion process using the transposition of a graph representing the network. This approach offers an acceptable tradeoff between runtime complexity and accurate approximation. In addition, using an approximation condition, the influence maximization process may be further tuned to dramatically reduce the computational complexity even more in certain circumstances while allowing a fallback to the unturned influence maximization process if the approximation condition is not satisfied.