The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2016
Filed:
Jul. 15, 2011
Applicants:
Amit S. Jariwala, Atlanta, GA (US);
David W. Rosen, Marietta, GA (US);
Fei Ding, Kennesaw, GA (US);
Inventors:
Assignee:
GEORGIA TECH RESEARCH CORPORATION, Atlanta, GA (US);
Primary Examiner:
Int. Cl.
CPC ...
G05B 11/01 (2006.01); B29C 67/00 (2006.01);
U.S. Cl.
CPC ...
G05B 11/01 (2013.01); B29C 67/0066 (2013.01); B29C 67/0088 (2013.01);
Abstract
Methods, systems, and apparatus, including computer programs encoded on a computer storage medium, for fabricating parts from photopolymer resin. In one aspect, a method includes iteratively determining a deviation measurement based on a simulated cured geometry and adjusted target geometry data until the deviation measurement is at or less than a threshold. The simulated cured geometry is determined, based in part, on an inhibition model.