The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2016
Filed:
Oct. 28, 2011
Applicants:
Jung Ho Je, Seoul, KR;
Jiwon Jung, Gyungbuk, KR;
Inventors:
Jung Ho Je, Seoul, KR;
Jiwon Jung, Gyungbuk, KR;
Assignee:
POSTECH ACADEMY-INDUSTRY FOUNDATION, Pohang-si, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 3/08 (2006.01); B82Y 10/00 (2011.01); G21K 1/06 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
G02B 3/08 (2013.01); B82Y 10/00 (2013.01); C23C 16/45555 (2013.01); G21K 1/062 (2013.01); G21K 1/067 (2013.01); G21K 2201/061 (2013.01); G21K 2201/067 (2013.01);
Abstract
The present invention relates to a method for manufacturing an X-ray/γ-ray focusing optical system comprising the steps of: providing a capillary substrate; and sequentially accumulating a plurality of alternation layers, each consisting of an X-ray/γ-ray opaque material and an X-ray/γ-ray transparent material, on an inner surface of the capillary substrate in a Fresnel pattern by atomic layer deposition.