The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2016
Filed:
Feb. 20, 2013
Shimadzu Corporation, Kyoto-shi, Kyoto, JP;
SHIMADZU CORPORATION, Kyoto-shi, JP;
Abstract
An analysis device comprising a discharge ionization current detector, a plasma gas supply section, a sample gas supply section, a flow rate setting condition holding section and a gas flow rate setting means controller. The flow rate setting condition holding section holds, as a flow rate setting condition, a relationship between a sample gas supply flow rate from the sample gas supply section and a supply flow rate of plasma gas to be set with respect to the sample gas supply flow rate and the gas flow rate controller is configured to set a plasma gas supply flow rate from the plasma gas supply section to a flow rate according to the sample gas supply flow rate, based on the flow rate setting condition held in the flow rate setting condition holding section.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile