The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2016
Filed:
Dec. 02, 2013
Murata Manufacturing Co., Ltd., Nagaokakyo-Shi, JP;
Takashi Kondo, Nagaokakyo, JP;
Seiji Kamba, Nagaokakyo, JP;
Yuichi Ogawa, Kyoto, JP;
Sakura Tomita, Kyoto-Fu, JP;
MURATA MANUFACTURING CO., LTD., Nagaokakyo-Shi, Kyoto-Fu, JP;
Abstract
The characteristics of a specimen are measured by holding the specimen on an aperture array structure having apertures, applying an electromagnetic wave to the aperture array structure, and detecting frequency characteristics of the electromagnetic wave reflected by the aperture array structure. A liquid is directly or indirectly attached to at least a part of a first principal surface. The electromagnetic wave is applied from side including a second principal surface. The apertures of the aperture array structure have a size which does not allow the liquid to leak from the first principal surface side to the second principal surface side, and the liquid is attached to the first principal surface of the aperture array structure in a state open to an atmosphere under air pressure.