The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 14, 2016

Filed:

Feb. 04, 2013
Applicant:

Mitsubishi Heavy Industries, Ltd., Tokyo, JP;

Inventors:

Kenta Haari, Tokyo, JP;

Osamu Shinada, Tokyo, JP;

Yasunari Shibata, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F23G 7/08 (2006.01); B01D 47/06 (2006.01);
U.S. Cl.
CPC ...
F23G 7/08 (2013.01); B01D 47/06 (2013.01);
Abstract

A ground flare system that can enhance the removal rate of dust and other such impurities contained in exhaust gas to be processed. The ground flare system that performs an incineration process on processing target gas and emits the processed gas to the atmosphere includes: a ground flare that combusts the processing target gas; a knock-out drum that is placed upstream of the ground flare and reduces a flow velocity of the processing target gas introduced thereto; a seal drum for backfire prevention placed upstream of the ground flare; a gas introducing pipe that introduces the processing target gas into the knock-out drum and/or the seal drum; and a water film forming unit that is provided inside of the gas introducing pipe and forms a water film of spray water in a direction that intersects with a flow direction of the processing target gas.


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